Raman measurements of temperature during continuous wave laser-induced heating of silicon
| dc.contributor.author | Lo, Ho Wai. | en_US |
| dc.date.accessioned | 2015-12-31T21:47:08Z | |
| dc.date.available | 2015-12-31T21:47:08Z | |
| dc.date.issued | 1979 | en_US |
| dc.date.published | 1979 | en_US |
| dc.description | Call number: LD2668 .T4 1979 L64 | en_US |
| dc.description.degree | Master of Science | en_US |
| dc.description.level | Masters | en_US |
| dc.identifier.uri | http://hdl.handle.net/2097/27142 | |
| dc.subject.AAT | Masters theses | en_US |
| dc.subject.LCSH | Silicon--Thermal properties. | en_US |
| dc.subject.LCSH | Temperature measurements. | en_US |
| dc.subject.LCSH | Raman spectroscopy. | en_US |
| dc.subject.LCSH | Lasers--Industrial applications. | en_US |
| dc.title | Raman measurements of temperature during continuous wave laser-induced heating of silicon | en_US |
| dc.type | Text | en_US |
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