Design, construction and proposed use of apparatus for measuring resistivity of thin films in the temperature range 4.2-300K̊
| dc.contributor.author | Sethna, Prochy Phiroze | en_US |
| dc.date.accessioned | 2011-07-12T21:32:51Z | |
| dc.date.available | 2011-07-12T21:32:51Z | |
| dc.date.digitized | 2010 | en_US |
| dc.date.issued | 1972 | en_US |
| dc.date.published | 1972 | en_US |
| dc.description | Digitized by Kansas Correctional Industries | en_US |
| dc.description.level | Masters | en_US |
| dc.identifier.uri | http://hdl.handle.net/2097/10614 | |
| dc.language | en_US | en_US |
| dc.publisher | Kansas State University | en_US |
| dc.rights.accessRights | This volume was digitized and made accessible online due to deterioration of the original print copy. If you are the author of this work and would like to have online access removed, please contact the Library Administration Office, 785-532-7400, library@k-state.edu. | en_US |
| dc.standard.bitdepth | 8 bit grayscale | en_US |
| dc.standard.capturehardware | Fujitsu fi-5120C | en_US |
| dc.standard.capturesoftwaresettings | Scandall 21 Version 4.3.11 | en_US |
| dc.standard.resolution | 200 dpi | en_US |
| dc.title | Design, construction and proposed use of apparatus for measuring resistivity of thin films in the temperature range 4.2-300K̊ | en_US |
| dc.type | Thesis | en_US |
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