From carrier dynamics inside fused silica to control of multiphoton-avalanche ionization for laser machining

dc.citation.doi10.1364/CLEO.2010.CMLL6
dc.citation.epage2en_US
dc.citation.isbn978-1-55752-890-2en_US
dc.citation.spage1en_US
dc.contributor.authorLei, Shuting
dc.contributor.authorGrojo, D.
dc.contributor.authorBarillot, T.
dc.contributor.authorGertsvolf, M.
dc.contributor.authorChang, Zenghu
dc.contributor.authorRayner, D. M.
dc.contributor.authorCorkum, P. B.
dc.contributor.authoreidleien_US
dc.date.accessioned2010-07-20T21:27:27Z
dc.date.available2010-07-20T21:27:27Z
dc.date.issued2010-05-16
dc.date.published2010en_US
dc.description.abstractUsing pump-probe measurements, we characterize carrier decay time inside fused silica and measure deeply bound self-trapped excitons. With pump-probe delay, we also control free carrier injection and the subsequent avalanche process for laser machining applications.en_US
dc.description.conference2010 Conference on Lasers and Electro-Optics (CLEO) and Quantum Electronics and Laser Science Conference (QELS), San Jose, California, May 16-21, 2010en_US
dc.description.versionArticle: Version of Record
dc.identifier.urihttp://hdl.handle.net/2097/4311
dc.publisherInstitute of Electrical and Electronics Engineersen_US
dc.relation.urihttps://doi.org/10.1364/CLEO.2010.CMLL6en_US
dc.rightsThis Item is protected by copyright and/or related rights. You are free to use this Item in any way that is permitted by the copyright and related rights legislation that applies to your use. For other uses you need to obtain permission from the rights-holder(s).en_US
dc.rights.urihttps://rightsstatements.org/page/InC/1.0/
dc.subjectMultiphoton processesen_US
dc.subjectUltrafast processesen_US
dc.subjectCondensed matteren_US
dc.subjectSemiconductorsen_US
dc.titleFrom carrier dynamics inside fused silica to control of multiphoton-avalanche ionization for laser machiningen_US
dc.typeTexten_US

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