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Nitrogen, implantation in N-type and P-type silicon

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dc.contributor.authorBorhani, Mostafaen_US
dc.date.accessioned2011-07-29T22:31:14Z
dc.date.available2011-07-29T22:31:14Z
dc.date.digitized2011en_US
dc.date.issued1976en_US
dc.date.published1976en_US
dc.descriptionDigitized by Kansas Correctional Industriesen_US
dc.description.levelMastersen_US
dc.identifier.urihttp://hdl.handle.net/2097/11311
dc.languageen_USen_US
dc.publisherKansas State Universityen_US
dc.rights.accessRightsThis volume was digitized and made accessible online due to deterioration of the original print copy. If you are the author of this work and would like to have online access removed, please contact the Library Administration Office, 785-532-7400, library@k-state.edu.en_US
dc.standard.bitdepth8 bit grayscaleen_US
dc.standard.capturehardwareFujitsu fi-5120Cen_US
dc.standard.capturesoftwaresettingsScandall 21 Version 4.3.11en_US
dc.standard.resolution200 dpien_US
dc.subject.LCSHIon implantationen_US
dc.subject.LCSHSemiconductorsen_US
dc.subject.LCSHSiliconen_US
dc.titleNitrogen, implantation in N-type and P-type siliconen_US
dc.typeThesisen_US

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