Hydrogen-anion formation near a (2×1)-reconstructed Si(100) surface: substrate-electronic-structure and trajectory dependence

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dc.contributor.author Obreshkov, Boyan
dc.contributor.author Thumm, Uwe P. E.
dc.date.accessioned 2013-05-30T19:04:10Z
dc.date.available 2013-05-30T19:04:10Z
dc.date.issued 2011-06-14
dc.identifier.uri http://hdl.handle.net/2097/15868
dc.description.abstract We calculated the yield of outgoing hydrogen negative ions after the reflection of 1-keV neutral hydrogen atoms from a (2×1)-reconstructed Si(100) surface. We find that the charge-transfer dynamics at the reconstructed surface is dependent on both the surface-electronic structure and orientation of the projectile trajectory relative to the crystal azimuthal directions. Our results are in good quantitative agreement with the measured Hˉ fractions of Maazouz and Esaulov [Surf. Sci. 398 49 (1998)] for scattering trajectories that are aligned perpendicularly to rows of silicon dimers. en_US
dc.language.iso en_US en_US
dc.relation.uri https://doi.org/10.1103/PhysRevA.83.062902 en_US
dc.rights This Item is protected by copyright and/or related rights. You are free to use this Item in any way that is permitted by the copyright and related rights legislation that applies to your use. For other uses you need to obtain permission from the rights-holder(s). en_US
dc.rights.uri http://rightsstatements.org/vocab/InC/1.0/
dc.subject Hydrogen-anion formation en_US
dc.title Hydrogen-anion formation near a (2×1)-reconstructed Si(100) surface: substrate-electronic-structure and trajectory dependence en_US
dc.type Article (publisher version) en_US
dc.date.published 2011 en_US
dc.citation.doi 10.1103/PhysRevA.83.062902 en_US
dc.citation.epage 062902-12 en_US
dc.citation.issue 6 en_US
dc.citation.jtitle Physical Review A en_US
dc.citation.spage 062902-1 en_US
dc.citation.volume 83 en_US
dc.contributor.authoreid thumm en_US


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