Hydrogen-anion formation near a (2×1)-reconstructed Si(100) surface: substrate-electronic-structure and trajectory dependence

dc.citation.doi10.1103/PhysRevA.83.062902en_US
dc.citation.epage062902-12en_US
dc.citation.issue6en_US
dc.citation.jtitlePhysical Review Aen_US
dc.citation.spage062902-1en_US
dc.citation.volume83en_US
dc.contributor.authorObreshkov, Boyan
dc.contributor.authorThumm, Uwe P. E.
dc.contributor.authoreidthummen_US
dc.date.accessioned2013-05-30T19:04:10Z
dc.date.available2013-05-30T19:04:10Z
dc.date.issued2011-06-14
dc.date.published2011en_US
dc.description.abstractWe calculated the yield of outgoing hydrogen negative ions after the reflection of 1-keV neutral hydrogen atoms from a (2×1)-reconstructed Si(100) surface. We find that the charge-transfer dynamics at the reconstructed surface is dependent on both the surface-electronic structure and orientation of the projectile trajectory relative to the crystal azimuthal directions. Our results are in good quantitative agreement with the measured Hˉ fractions of Maazouz and Esaulov [Surf. Sci. 398 49 (1998)] for scattering trajectories that are aligned perpendicularly to rows of silicon dimers.en_US
dc.identifier.urihttp://hdl.handle.net/2097/15868
dc.language.isoen_USen_US
dc.relation.urihttps://doi.org/10.1103/PhysRevA.83.062902en_US
dc.rightsThis Item is protected by copyright and/or related rights. You are free to use this Item in any way that is permitted by the copyright and related rights legislation that applies to your use. For other uses you need to obtain permission from the rights-holder(s).en_US
dc.rights.urihttp://rightsstatements.org/vocab/InC/1.0/
dc.subjectHydrogen-anion formationen_US
dc.titleHydrogen-anion formation near a (2×1)-reconstructed Si(100) surface: substrate-electronic-structure and trajectory dependenceen_US
dc.typeArticle (publisher version)en_US

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