Rutherford backscattering in ion-implanted and pulsed laser annealed Si and Ge

Kiger, Shanalyn.2015-12-312015-12-311985http://hdl.handle.net/2097/27521Call number: LD2668 .T4 1985 K53Backscattering.Ion implantation.Semiconductors--Impurity distribution.Semiconductor lasers.Germanium--Spectra.Silicon--Spectra.Rutherford backscattering in ion-implanted and pulsed laser annealed Si and GeTextMasters theses