Thermodynamic analysis and purification for source materials in sublimation crystal growth of aluminum nitride

dc.citation.ctitleIII-Nitride Materials for Sensing, Energy Conversion and Controlled Light-Mater Interactionsen_US
dc.citation.doi10.1557/PROC-1202-I05-08en_US
dc.citation.isbn978-1-60511-175-9en_US
dc.citation.jtitleMaterials Research Society Symposium Proceedingsen_US
dc.citation.volume25en_US
dc.contributor.authorDu, Li
dc.contributor.authorEdgar, James H.
dc.contributor.authoreidedgarjhen_US
dc.date.accessioned2010-07-29T20:03:46Z
dc.date.available2010-07-29T20:03:46Z
dc.date.issued2020-12-10
dc.date.published2010en_US
dc.description.abstractSource material purification according to a thermodynamic analysis is reported for the sublimation crystal growth of aluminum nitride in an inert reactor. OAlOH is strongly favored over all other possible oxygen containing compounds in both the Al-O-H-N and Al-O-H-C-N systems, while Al2O the most favorable oxygen containing gas species for Al-O-N system, become secondary favorable gas species. A low temperature (<1200 °C) treatment is effective in eliminating oxygen and hydrogen from the source powder. Carbon monoxide is another important oxygen containing gas species in the Al-O-H-C-N system, and is favored over Al2O at certain temperature and pressure. Carbothermal reduction with intentionally added carbon (graphite) can further reduce the oxygen concentration. Experiments show that high-temperature sintering minimizes the oxygen concentration and reduces the specific surface area of the source. With 5.5% of mass loss, source purification reduced impurities concentrations to 0.019±0.001wt%O, 7±1ppmH, and 0.010±0.004wt%C.en_US
dc.description.conferenceIII-nitride materials for sensing, energy conversion and controlled light-matter interactions : symposium held November 29-December 3, 2009, Boston, Massachusetts, U.S.A.en_US
dc.identifier.urihttp://hdl.handle.net/2097/4326
dc.publisherMaterials Research Societyen_US
dc.relation.urihttp://doi.org/10.1557/PROC-1202-I05-08en_US
dc.rightsThis Item is protected by copyright and/or related rights. You are free to use this Item in any way that is permitted by the copyright and related rights legislation that applies to your use. For other uses you need to obtain permission from the rights-holder(s).en_US
dc.rights.urihttps://rightsstatements.org/vocab/InC/1.0/
dc.subjectSingle crystal growthen_US
dc.subjectGrowth from vaporen_US
dc.subjectAluminum nitrideen
dc.subjectThermodynamicsen
dc.titleThermodynamic analysis and purification for source materials in sublimation crystal growth of aluminum nitrideen_US
dc.typeTexten_US

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