Sublimation Growth of Titanium Nitride Crystals

dc.citation.doi10.1007/s10854-009-9873-8en_US
dc.citation.epage87en_US
dc.citation.issue1en_US
dc.citation.jtitleJournal of Materials Science: Materials in Electronicsen_US
dc.citation.spage78en_US
dc.citation.volume21en_US
dc.contributor.authorDu, Li
dc.contributor.authorEdgar, James H.
dc.contributor.authorKenik, Edward A.
dc.contributor.authorMeyer III, Harry
dc.contributor.authoreidedgarjhen_US
dc.date.accessioned2010-03-24T21:43:00Z
dc.date.available2010-03-24T21:43:00Z
dc.date.issued2010-03-24T21:43:00Z
dc.date.published2010en_US
dc.description.abstractThe sublimation-recondensation growth of titanium nitride crystals with N/Ti ratio of 0.99 on tungsten substrates is reported. The growth rate dependence on temperature and pressure was determined, and the calculated activation energy was 775.8±29.8kJ/mol. The lateral and vertical growth rates changed with the time of growth and the fraction of the tungsten substrate surface covered. The orientation relationship of TiN (001) || W (001) with TiN [100] || W [110], a 45o angle between TiN [100] and W [100], occurs not only for TiN crystals deposited on (001) textured tungsten but also for TiN crystals deposited on randomly orientated tungsten. This study demonstrates that this preferred orientational relationship minimizes the lattice mismatch between the TiN and tungsten.en_US
dc.identifier.urihttp://hdl.handle.net/2097/3279
dc.rightsThis Item is protected by copyright and/or related rights. You are free to use this Item in any way that is permitted by the copyright and related rights legislation that applies to your use. For other uses you need to obtain permission from the rights-holder(s).en_US
dc.rights.urihttps://rightsstatements.org/page/InC/1.0/?language=en
dc.subjectTiNen_US
dc.subjectSublimation growthen_US
dc.subjectTungsten substrateen_US
dc.subjectActivation energyen_US
dc.subjectOrientationen_US
dc.titleSublimation Growth of Titanium Nitride Crystalsen_US
dc.typeTexten_US

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