Near-infrared femtosecond laser machining initiated by ultraviolet multiphoton ionization

dc.citation.doi10.1063/1.4794946en_US
dc.citation.epage101111-4en_US
dc.citation.issue10en_US
dc.citation.jtitleApplied Physics Lettersen_US
dc.citation.spage101111-1en_US
dc.citation.volume102en_US
dc.contributor.authorYu, Xiaoming
dc.contributor.authorBian, Qiumei
dc.contributor.authorZhao, B.
dc.contributor.authorChang, Zenghu
dc.contributor.authorCorkum, P. B.
dc.contributor.authorLei, Shuting
dc.contributor.authoreidleien_US
dc.date.accessioned2013-05-06T21:27:06Z
dc.date.available2013-05-06T21:27:06Z
dc.date.issued2013-02-01
dc.date.published2013en_US
dc.description.abstractWe report on the experimental study of microstructures fabricated on the surface of fused silica by two femtosecond laser pulses, a tightly focused 266 nm beam followed by a loosely focused 800 nm beam. By setting the fluence of each pulse below the damage threshold, visible microstructures are fabricated using the combined beams. Our results suggest that the ultraviolet pulse generates seed electrons through multiphoton absorption, and the near-infrared pulse utilizes these electrons to cause damage by avalanche ionization.en_US
dc.description.versionArticle: Version of Record
dc.identifier.urihttp://hdl.handle.net/2097/15747
dc.language.isoen_USen_US
dc.relation.urihttp://doi.org/10.1063/1.4794946en_US
dc.rightsThis Item is protected by copyright and/or related rights. You are free to use this Item in any way that is permitted by the copyright and related rights legislation that applies to your use. For other uses you need to obtain permission from the rights-holder(s).en_US
dc.rights.urihttps://rightsstatements.org/page/InC/1.0/
dc.subjectMicrostructuresen_US
dc.subjectUltraviolet multiphoton ionizationen_US
dc.titleNear-infrared femtosecond laser machining initiated by ultraviolet multiphoton ionizationen_US
dc.typeTexten_US

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