Damage formation on fused silica illuminated with ultraviolet-infrared femtosecond pulse pairs
Date
2015-05-12
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Citation: Yu, X., Chang, Z., Corkum, P. B., & Lei, S. (2015). Damage formation on fused silica illuminated with ultraviolet-infrared femtosecond pulse pairs. Proceedings of SPIE. doi:10.1117/12.2182633
We investigate damage formation on the surface of fused silica by two femtosecond laser pulses, a tightly focused 266 nm (UV) pulse followed by a loosely focused 800 nm (IR) pulse. We show that the damage size is determined by the UV pulse, and only a small fraction of the normal UV damage threshold energy is needed to cause damage when combined with the properly delayed IR pulse. Our results, analyzed with a rate equation model, suggest that the UV pulse generates seed electrons through multiphoton absorption and the IR pulse utilizes these electrons to cause damage by avalanche ionization. By tuning such parameters like pulse energy, time delay, IR pulse duration and polarization, we further demonstrate that damage profile can be controlled. Copyright © 2015 SPIE.
We investigate damage formation on the surface of fused silica by two femtosecond laser pulses, a tightly focused 266 nm (UV) pulse followed by a loosely focused 800 nm (IR) pulse. We show that the damage size is determined by the UV pulse, and only a small fraction of the normal UV damage threshold energy is needed to cause damage when combined with the properly delayed IR pulse. Our results, analyzed with a rate equation model, suggest that the UV pulse generates seed electrons through multiphoton absorption and the IR pulse utilizes these electrons to cause damage by avalanche ionization. By tuning such parameters like pulse energy, time delay, IR pulse duration and polarization, we further demonstrate that damage profile can be controlled. Copyright © 2015 SPIE.
Keywords
Avalanche Ionization, Femtosecond Laser Machining, Fused Silica, Ir Pulse, Multiphoton Ionization, Uv Pulse
