Hydrogen-anion formation near a (2×1)-reconstructed Si(100) surface: Substrate-electronic-structure and trajectory dependence

dc.citation.doi10.1103/PhysRevA.83.062902
dc.citation.issn1050-2947
dc.citation.issue6
dc.citation.jtitlePhysical Review A
dc.citation.volume83
dc.contributor.authorObreshkov, Boyan
dc.contributor.authorThumm, Uwe
dc.date.accessioned2023-12-07T18:56:11Z
dc.date.available2023-12-07T18:56:11Z
dc.date.issued2011-06-14
dc.date.published2011-06-14
dc.description.abstractWe calculated the yield of outgoing hydrogen negative ions after the reflection of 1-keV neutral hydrogen atoms from a (2×1)-reconstructed Si(100) surface. We find that the charge-transfer dynamics at the reconstructed surface is dependent on both the surface-electronic structure and orientation of the projectile trajectory relative to the crystal azimuthal directions. Our results are in good quantitative agreement with the measured H− fractions of Maazouz and Esaulov [Surf. Sci. 398, 49 (1998)] for scattering trajectories that are aligned perpendicularly to rows of silicon dimers.
dc.identifier.urihttps://hdl.handle.net/2097/43837
dc.relation.urihttps://link.aps.org/doi/10.1103/PhysRevA.83.062902
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dc.titleHydrogen-anion formation near a (2×1)-reconstructed Si(100) surface: Substrate-electronic-structure and trajectory dependence
dc.typeText

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