Damage formation on fused silica illuminated with ultraviolet-infrared femtosecond pulse pairs

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dc.contributor.author Yu, X.
dc.contributor.author Chang, Zenghu
dc.contributor.author Corkum, P. B.
dc.contributor.author Lei, Shuting T.
dc.date.accessioned 2016-04-06T14:54:06Z
dc.date.available 2016-04-06T14:54:06Z
dc.identifier.uri http://hdl.handle.net/2097/32337
dc.description Citation: Yu, X., Chang, Z., Corkum, P. B., & Lei, S. (2015). Damage formation on fused silica illuminated with ultraviolet-infrared femtosecond pulse pairs. Proceedings of SPIE. doi:10.1117/12.2182633
dc.description We investigate damage formation on the surface of fused silica by two femtosecond laser pulses, a tightly focused 266 nm (UV) pulse followed by a loosely focused 800 nm (IR) pulse. We show that the damage size is determined by the UV pulse, and only a small fraction of the normal UV damage threshold energy is needed to cause damage when combined with the properly delayed IR pulse. Our results, analyzed with a rate equation model, suggest that the UV pulse generates seed electrons through multiphoton absorption and the IR pulse utilizes these electrons to cause damage by avalanche ionization. By tuning such parameters like pulse energy, time delay, IR pulse duration and polarization, we further demonstrate that damage profile can be controlled. Copyright © 2015 SPIE.
dc.relation.uri https://doi.org/10.1117/12.2182633
dc.rights Copyright 2015 Society of Photo-Optical Instrumentation Engineers
dc.rights.uri http://www.sherpa.ac.uk/romeo/issn/0277-786X/
dc.subject Avalanche Ionization
dc.subject Femtosecond Laser Machining
dc.subject Fused Silica
dc.subject Ir Pulse
dc.subject Multiphoton Ionization
dc.subject Uv Pulse
dc.title Damage formation on fused silica illuminated with ultraviolet-infrared femtosecond pulse pairs
dc.type Article
dc.date.published 2015
dc.citation.doi 10.1117/12.2182633
dc.citation.issn 0277-786X
dc.citation.jtitle Proceedings of SPIE
dc.citation.volume 9511
dc.contributor.authoreid lei


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