Browsing Chemical Engineering by Author "Nepal, N."

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Browsing Chemical Engineering by Author "Nepal, N."

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  • Wei, Daming; Hossain, T.; Nepal, N.; Garces, N. Y.; Hite, J. K.; Meyer, H. M. III; Eddy, C. R. Jr.; Edgar, James H. (2014-07-22)
    This study compares the physical, chemical and electrical properties of Al[subscript 2]O[subscript 3] thin films deposited on gallium polar c- and nonpolar m -plane GaN substrates by atomic layer deposition (ALD). Correlations ...
  • Hossain, T.; Wei, Daming; Edgar, James H.; Garces, N. Y.; Nepal, N.; Hite, J. K.; Mastro, M. A.; Eddy C.R, Jr.; Meyer H.M, III
    The surface preparation for depositing Al2O3 for fabricating Au/Ni/Al2O3/n-GaN (0001) metal oxide semiconductor (MOS) capacitors was optimized as a step toward realization of high performance GaN MOSFETs. The GaN surface ...
  • Wei, Daming; Hossain, T.; Garces, N. Y.; Nepal, N.; Meyer, H. M., III; Kirkham, M. J.; Eddy, C. R. Jr.; Edgar, James H. (2013-08-28)
    This paper reports on the influence of deposition temperature on the structure, composition, and electrical properties of TiO[subscript 2] thin films deposited on n-type silicon (100) by plasma-assisted atomic layer ...
  • Sedhain, A.; Nepal, N.; Nakarmi, M. L.; Al tahtamouni, T. M.; Lin, J. Y.; Jiang, H. X.; Gu, Z.; Edgar, James H. (2009-11-13)
    AlN homoepilayers and heteroepilayers were grown on polar c-plane and nonpolar a-plane and m-plane orientations of AlN bulk and sapphire substrates by metal organic chemical vapor deposition. A systematic comparative ...

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